柔红霉素在钴离子注入修饰电极上的电化学行为及其应用

Electrochemical behavior of daunorubicin at Co/GC ion implantation modified electrode and the application of the electrode

目的 研究柔红霉素在Co/GC离子注入修饰玻碳电极上的电化学行为及其应用。方法 柔红霉素在0.05 mol·L-1Na2HPO4-KH2PO4溶液(pH 6.82)中,用CO/Gc离子注入修饰电极进行伏安测定。结果 得到一个良好的还原峰,峰电位为-0.60 V(vs SCE)。峰电流与柔红霉素的浓度在2.84×10-8-1.42×10-6mol·L-1和1.42×10-6-1.28×10-5mol·L-1呈线性关系,r分别为0.999 2和0.999 3,检出限为1.42×10-8mol·L-1。用于注射液中柔红霉素的测定,回收率为95.8％～102.8％。用线性扫描、循环伏安法研究了柔红霉素的电化学行为及其机制。结论 电极反应为具有吸附性质的准可逆过程,质子化的柔红霉素在电极表面得到2个电子和1个质子还原。离子注入电极对柔红霉素具有电催化活性。

Aim To study the electrochemical behavior of daunorubicin at Co/GC ion implantation modified electrode. Methods With Co/GC ion implantation modified electrode as working electrode, daunorubicin was determined by voltammetry in 0.05 mol · L-1Na2HPO4-KH2PO4( pH 6. 82) solution. Results A sensitive reductive peak of daunorubicin was obtained by linear sweep voltammetry. The peak potential was - 0. 60 V ( vs SCE ).The peak current was proportional to the concentration of daunorubicin over the range of 2. 84 × 10-8 - 1. 42 × 10-6 mol · L-1 and 1. 42×10-6 - 1. 28 ×10-5 mol·L-1 with the detection limit of 1.42×10-8 mol ·L-1. The reduction wave was applied to the determination of daunorubicin. The electrochemical behavior and reaction mechanism were studied by linear sweep and cyclic voltammetry. Conclusion The reduction process was quasi-reversible with adsorption characteristics.