TbCo/Cr非晶垂直磁化膜的磁特性

Preparation and Properties of TbCo/Cr Amorphous Films with Perpendicular Anisotropy

在 SPF-430H 溅射系统上采用不加偏压的射频磁控溅射法制备了 TbCo 非晶垂直磁化膜, 并就 Cr 底层对 TbCo 非晶垂直磁化膜磁性能的影响进行了研究。结果表明,Cr 底层的存在能够增强 TbCo 非晶垂直磁化膜的磁各向异性,并使得其矫顽力增加。分别采用 VTBH-1 型高感度振动样品磁强计和 MTL-1 磁转矩系统测量了 TbCo薄膜的磁滞回线和磁转矩曲线。结果发现,厚度为 120 nm,并带有 180 nm 厚度 Cr 底层的 Tb31C69 薄膜的矫顽力和磁各向异性能分别高达 51.2×104 A/m 和 0.457 J/cm3;没有带 Cr 底层的同样厚度的 Tb31C69 薄膜的矫顽力和磁各向异性能分别只有 35.2×104 A/m 和 0.324 J/cm3。Hitachi X-650 型扫描电镜的观测结果表明,带有 Cr 底层的TbCo 薄膜具有柱状结构,这一柱状结构导致了磁各向异性能的增强以及矫顽力的提高。

The amorphous TbCo Cr films with perpendicular anisotropy had been prepared with SPF-430H r.f-magnetron sputtering system by nonbiased method and the effects of Cr underlayer on the magnetic properties of the TbCo films were investigated. It was found that the Cr underlayer could enhance the perpendicular anisotropy and increase the coercivity of the amorphous TbCo films. The magnetic hysteresis loops and the magnetic torque curves of the TbCo films were measured respectively using the VTBH-1 high sensitivity VSM and the MTL-1 magnetic torque curve measuring system. The results showed that the coercivity as high as 51.2 x 10(4) A/m and the magnetic anisotropy energy of 0.457 J/cm(3) were obtained in 120nm Tb31C69 films with 180nm Cr underlayer. But it was only 35.2 x 10(4) A/m and 0.324 J/cm(3) for the same thickness Tb31Co69 films without Cr underlayer. The results determined by scanning electron microscopy with Hitachi X-650 indicated that the TbCo film with the Cr underlayer composed of the column structure which results in improving the perpendicular anisotropy and increasing the coercivity of the TbCo films in the presence of the Cr underlayer.