摘要
采用正交实验法探索了化学沉积钴硼合金纳米晶涂层的制备工艺 ,并对其沉积速率进行了研究 ,从而得出较优的工艺参数 ,同时详细讨论了硫酸钴、酒石酸钠、DMAB(二甲基胺硼烷 )、温度等因素对沉积速率的影响。
The preparation process for electroless deposition of Co-B alloy nanocrystalline coating is investigated by using perpendicular method and its deposition rate is also studied, thus obtaining optimum process parameters. At the same time, the effects of CoSO 4·7H 2O, Na 2C 4H 4O 6·2H 2O, DMAB, temperature and other factors on deposition rate are discussed in detail.
出处
《电镀与环保》
CAS
CSCD
2004年第4期27-29,共3页
Electroplating & Pollution Control
基金
安徽省自然科学基金"电化学沉积纳米涂层组成设计
制备与性能研究"( 0 0 0 464 0 3 )
合肥工业大学中青年创新群体基金 (纳米结构与功能纳米材料 )资助
