Ti对磁控溅射不锈钢薄膜结构的影响

EFFECT OF Ti ON MICROSTRUCTURE OF STEEL 321 FILM SYNTHESIZED BY MAGNETRON SPUTTERING DEPOSITION

研究了磁控溅射321不锈钢薄膜内Ti对膜结构由晶态向非晶态转化的影响用X射线衍射分析了膜的结构,结果表明,膜的结构随含Ti量不同而有变化在Ti含量(wt-％)为0—3,3—10,10-18,18-30时,膜的结构分别为α-Fe,α-Fe+x相,非晶+微晶。

Effect of increasing content of Ti on the crystalline to amorphous transition inalloy films of stainless steel 321 plus Ti synthesized by high rate magnetron sputtering deposi-tion is reported. X-ray diffraction analysis revealed that the microstructure of film issequently changed from α-Fe, α-Fe+x-phase, microcrystalline-amorphous into amorphouswith increasing content of Ti from 0-3, 3-10, 10-18 to 18-30wt-% respectively.