常压介质阻挡放电非平衡等离子体渗氮

Atmospheric pressure non-equilibrium plasma nitriding using dielectric barrier discharge

利用介质阻挡放电 ,在自行研制的设备上进行常压非平衡等离子体渗氮 .研究表明 ,该新工艺不仅在很短时间内在试样表面得到很深的渗层和白亮层 ,而且省去了真空放电下必须的真空设备 ,整个工艺过程操作简便 ,是一种很有发展前景的新工艺 .此外 ,还分析了渗层深度及硬度随放电间隙不同的变化规律 .

Using dielectric barrier discharge(DBD), atmospheric pressure non equilibrium plasma nitriding technology is under development at self made equipment. The research result of this new technology shows that not only white layer and diffusion layer on the treated surface has been found thicker in short time, but the experiment has been done without expensive vacuum equipment as well. The whole process is simple and convenient and the new technology will be promising in the field of mechanical industry in the future. Besides,deepness and hardness of layer variable with discharge distance was analysed.