超深亚微米层次互连特性及其布局布线优化(英文)

VDSM interconnect characteristics and the place and route optimization

随着集成电路特征尺寸进入超深亚微米层次,互连线开始成为制约系统功能和可靠性的决定性因素。本文介绍了布局布线中的几种优化步骤:拥挤驱动布局、局部布局和搜索提炼、轨道分配和搜索修补。并结合Synopsys公司的超深亚微米布局布线系统APOLLO-Ⅱ有效地解决了互连线的串扰噪声和破坏问题。

As the ICs are scaled into very deep submicrometer dimensions,interconn ects becomes critical in determining overall system performence and reliability. This paper presents some optimization steps in place and route flow,includin g congestion-driven placement,area placement and search & refine,track assignme nt and search & repair. The optimization steps integrated with the VDSM place an d route systems Apollo-Ⅱ can efficiently solve the interconnects challenges su ch as crosstalk noise and violations.