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Plasma-nitriding of tantalum at relatively low temperature

Plasma-nitriding of tantalum at relatively low temperature
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摘要 The combined quadratic orthogonal regression method of experiment design wasemployed to explore the effects of process parameters of plasma nitriding of tantalum such as totalpressure, temperature and original hydrogen molar fraction on the hardness, roughness and structureof nitriding surfaces. The regression equations of hardness, roughness and structure were givenaccording to the results of regression and statistic analysis. And the diffusion activation energyof nitrogen in tantalum on plasma nitriding conditions was calculated according to the experimentaldata of hardness of plasma-nitriding of tantalum vs time and temperature. The diffusion activationenergy calculated belongs to (155.49 +- 10.51) kJ/mol (783-983 K). The combined quadratic orthogonal regression method of experiment design wasemployed to explore the effects of process parameters of plasma nitriding of tantalum such as totalpressure, temperature and original hydrogen molar fraction on the hardness, roughness and structureof nitriding surfaces. The regression equations of hardness, roughness and structure were givenaccording to the results of regression and statistic analysis. And the diffusion activation energyof nitrogen in tantalum on plasma nitriding conditions was calculated according to the experimentaldata of hardness of plasma-nitriding of tantalum vs time and temperature. The diffusion activationenergy calculated belongs to (155.49 +- 10.51) kJ/mol (783-983 K).
出处 《Rare Metals》 SCIE EI CAS CSCD 2004年第2期185-188,共4页 稀有金属(英文版)
关键词 surface and interface of materials plasma nitriding orthogonal regressionmethod TANTALUM surface and interface of materials plasma nitriding orthogonal regressionmethod tantalum
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