等离子体化学气相沉积参量对Ar等离子体电子特性的影响

Effect of plasma chemical vapor deposition parameters on electron property in Ar plasma

采用加热的调谐单探针技术,研究了射频辉光放电Ar等离子体空间电子能量分布函数,电子平均能量和电子密度,并系统分析了等离子体增强化学气相沉积工艺参量对等离子体空间电子特性的影响。

This paper reports that a heated and tuned Langmuir probe has been used on the measurements of the electron energy distribution function f(E), the mean electron energy and the electron concentration in radio frequency glow discharge plasma in argon. The effect of the plasma enhanced chemical vapor deposition parameters on the electron properties in Ar plasma has been systematically analyzed.