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超声喷雾方法制备低辐射玻璃

Preparation of low-emission glass by ultrasonic spray deposition method
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摘要 利用超声喷雾方法在玻璃基板上喷涂SnO2 :F薄膜 ,制备了低辐射玻璃 (Low E玻璃 ) .通过光谱测量 ,得到其可见光透过率为 85 %以上 ,在近红外波段出现高反射 .利用四探针测量仪 ,测量其面电阻在 2Ω/cm2 以下 .扫描电镜测量结果表明膜的均匀性较好 ,平均颗粒直径约在 5 0nm .利用等离子体截止波长理论 ,解释了低辐射玻璃红外反射的物理机制 . Low-emission glass is prepared by spraying SnO 2:F films on glass substrate using ultrasonic spray deposition method. Transmission in visible region is over 85%, and high reflectance appears in near-infrared region. The sheet resistance is below 2 Ω/cm 2 measured by a four-point probe. SEM observation indicates that the average particle size is 50 nm with good uniformity. The physical mechanism about reflection of low-emission glass in near-infrared region is explained by using plasma cut-off frequency theory .
出处 《物理实验》 北大核心 2004年第12期16-19,共4页 Physics Experimentation
关键词 超声喷雾热解法 SnO2:F薄膜 低辐射玻璃 ultrasonic spray deposition SnO 2:F thin film low-emission glass
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参考文献2

  • 1Subrahmanyam A, Vasu V, Santanaraghavan P, et al. Photovoltaic properties of sprayed In2O3-InP junctions[J]. Mater. Sci. Eng. B, 1992,14:365.
  • 2Swanepoel R. Determination of the thickness and optical constants of amorphous silicon[J]. J. Phys. E: Sci. Instrum., 1983,16:1 214-1 222.

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