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C/[Co5nm/Cxnm]_4/C纳米颗粒膜的微结构和磁特性研究

Microstructural and Magnetic Properties of C/[Co5nm/Cxnm]_4/C Multilayers Nanogranular Films
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摘要 在室温下,应用对靶磁控溅射法制备了多层C/[Co5nm/Cxnm]4/C颗粒膜.C靶和Co靶分别采用了射频溅射和直流对靶溅射模式,随后进行了原位退火.用振动样品磁强计(VSM)和扫描探针显微镜(SPM)系统研究了插层C层的厚度对多层颗粒膜的微结构和磁特性的影响.X射线衍射(XRD)图样显示出样品具有六角密堆积结构.振动样品磁强计测量表明磁矩很好地排列在膜面内,在插层C层的厚度为12nm时矫顽力达到最大值,剩磁比接近于1. Multilayers nanogranular C/[Co5nm/Cxnm]_4/C films have been prepared by magnetron sputtering from C and Co onto glass substrates at room temperature and subsequent in situ annealing.C and Co targets use an RF and DC facing deposition mode respectively.The structural and magnetic properties of films at room temperature were investigated as functions of C insert-layer thickness.X-ray diffraction shows the majority Co nanograins are formed as the hexagonal-close-packed structure.Vibrating sample magnetometer measurements indicate that the magnetic moment lies well in the film plane.For film with the insert-layer thickness of 12nm.H_c reaches maximum and remanent squareness close to 1.
出处 《河北师范大学学报(自然科学版)》 CAS 2004年第6期571-574,共4页 Journal of Hebei Normal University:Natural Science
基金 国家自然科学基金资助项目(10274018) 河北省教育厅科学研究基金资助项目(002013) 河北师范大学重点学科资助项目(120203)
关键词 纳米颗粒膜 磁特性 磁矩 射频溅射 微结构 最大值 磁控溅射法 振动样品磁强计 矫顽力 剩磁 nanogranular films in situ annealing  magnetron sputtering coercivity remanent squareness
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参考文献11

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