摘要
对大面积矩形强流电子束自磁场在无限长束模型和有限长束模型下作了计算,给出了磁场的强度分布,并计算了在自磁场作用下的束电子的运动轨迹。描述了电子束在传输方向距阴极6cm处的箍缩图样。计算中考虑了二极管电场力,忽略了膜及Hibechi对束流的散射效应。
An uniform rectangular Intense Relativistic Electron Beam is important to KrF excimer.The main factors that affect the uniformity of e -beam include two aspects: one is the diode design and diode electrical field, the other is the self-magnetic field. In this paper the effect of self-magnetic field on the uniformity of e -beam is studied. The intensity distribution of self-magnetic field is calculated in two cases. In one case, the retangular e-beam is supposed to be infinite long along z -direction, in the other case, finite long. The trajectories of the moving electrons in self-magnetic field are also calculated. From these calculation the beam pinching sections at 6-cm distance from diode cathode in z-direction are discribed. In the calculation, the electrical field force is taken into account, and the scattering effect of e -beam of foils and Hibachi is neglected. This is useful to improving laser quality of hundred joule level KrF excimer laser.
出处
《强激光与粒子束》
EI
CAS
CSCD
1993年第1期111-117,共7页
High Power Laser and Particle Beams
关键词
自磁场
电子束
束流
均匀性
磁场
rectangular e-beam, self-magnetic field, magnetic field pinching.