金刚石薄膜的合成及相应的等离子体状态

Synthesis of Diamond Films and Related Plasma State

本文报道了用热阴极直流辉光放电等离子体化学气相沉积(PCVD)方法,在单晶硅和石英玻璃基片上合成金刚石薄膜的结果。采用 X 射线衍射、Raman 散射、扫描电子显微镜和傅利叶变换红外光谱测定了合成膜的性能。初步探讨了合成金刚石条件下等离子体的状态,利用朗缪尔探针诊断了在金刚石生长条件下等离子体的电子温度和密度。

Diamond thin films were deposited on silicon and quartz glass su-bstrate by hot cathode direct current glow discharge plasma chemical vapor depo-sition from a mixture of methane and hydrogen.The properties of diamond filmwere characterized using the X-ray diffraction,Raman shift,scanning electronmicroscope and Fourier transform infrared spectroscopy.The electron tempe-rature and electron density of plasma were diagnosed in situ by the Langmuirprobe during deposition.