摘要
采用交替沉积磁控溅射工艺制备了超薄多层的FeCoB SiO2 磁性纳米颗粒膜 .利用x射线衍射仪、扫描探针显微镜、透射电子显微镜分析了薄膜的微结构和形貌特征 .采用振动样品磁强计、四探针法、微波矢量分析仪及谐振腔法测量薄膜试样的磁电性能和微波复磁导率 .重点对SiO2 介质相含量、薄膜微结构对电磁性能产生重要影响的机理做了分析和探讨 .结果表明 :这类FeCoB SiO2 磁性纳米颗粒膜具有良好的软磁性能和高频电磁性能 ,2GHz时的磁导率 μ′高于 70 。
FeCoB-SiO 2 nano-granular films were fabricated by alternately deposited multilayers using radio frequency magnetron sputtering. Microstructures and morphology were analyzed by x-ray diffraction,scanning probe microscope and transmission electron microscope. Magnetic parameters were measured by vibrating sample magnetometer. The electrical resistivity was measured by a direct current four-probe method,and the complex permeability was measured by microwave resonance cavity. The mechanism of the effect of microstructures and content of SiO 2 on electromagnetic characteristics was also discussed. Results show that these films have good performance at high frequencies. μ′ can be larger than 70 at 2?GHz. Thus,the films may be applied to the micromagnetic devices or microwave absorbers in the GHz range.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2004年第12期4359-4363,共5页
Acta Physica Sinica
基金
国家自然科学基金 (批准号 :5 0 3 710 2 9)资助的课题~~