期刊文献+

曝光强度对卤化银微晶中载流子行为及其陷阱效应的影响 被引量:3

The Influence of Exposure Intensity on the Behavior of Carriers and the Trap Effect in Silver Halide Microcrystals
下载PDF
导出
摘要 针对卤化银感光材料潜影形成过程中光作用动力学问题,分析了曝光强度对光生载流子行为和电子陷阱效应的影响,认为伴随着曝光强度的增加,影响光电子衰减的因素由电子陷阱起主要作用演化到电子陷阱和复合中心共同起作用进而演化到复合中心起主要作用. For the question of the photo-action kinetics in the formation process of latent image in silver halide material, the influences of exposure intensity on the behavior of photo-generation carriers and electron trap effect are analyzed. It is obtained that the main factor influencing the decay of photoelectrons evolves from electron traps to the combination of electron traps and recombination centers, and then to recombination centers.
出处 《感光科学与光化学》 EI CSCD 2005年第1期21-28,共8页 Photographic Science and Photochemistry
基金 国家自然科学基金项目(10274017 10354001) 河北省自然科学基金项目(103097) 教育部重点项目(01011)资助课题.
关键词 电子陷阱 复合中心 曝光强度 光电子 光空穴 卤化银 electron trap recombination center exposure intensity photoelectron photohole silver halide Corresponding author: LIU Rong-juan
  • 相关文献

参考文献12

  • 1Mees C E K, James T H. The Theory of the Photographic Process[M]. The first edit. Beijing: Science Press, 1979.125-142.
  • 2M Van den Eeden, F Callens, et al. Computer simulation of transient microwave photoconductivity in silver halide[J]. J Imaging Sci Tech , 1994,38(5) :475-483.
  • 3M Van den Eeden, F Callens, et al. Transient microwave photoconductivity and computer simulation study of Ir3+-and Rh3+ - doped AgCI microcrystal[J]. J Imaging Sci Tech , 1995,39(5) :393-401.
  • 4Hua J P, Callens F, et al. Transient photocoductivity study of shallow electron traps in [Ru(CN)6]4- doped AgCl microcrystals: effects of doping concentration position[J ]. J Imaging Sci , 1999,47: 71-79.
  • 5Hua J P, Callens F, et al. Determination of capture cross sections and trap depths of dominant centers in AgCI microcrystals doped with [Ru(CN)6]4- complexes[J]. J Phys D :Appl Phys ,2000,33:574-583.
  • 6Hua J P, Callens F, et al. Shallow electron traps induced by [Ru(CN)6]4 in AgCl microcrystals: a computer simulation study of transient microwave photoconductivity [J ]. J Phys D : Appl Phys , 2000,33 : 564-573.
  • 7Li X W, C, eng A C, Yang S P, et al. Measurement of the time-resolved spectrum of photoelectrons from ZnS: Mn,Cu luminescent material[J]. Chinese Physics Letters ,2003,20(8) : 1323-1325.
  • 8Mitchell J W. The trapping of electrons in crystals of silver halide [J ]. Photographic Science and Engineer, 1983,27:96.
  • 9Wang R Q, et al. Electron trapping and recombination in cubic AgBr emulsion [J]. The Journal of Photographic Science, 1996,44: 47-49.
  • 10Myra T Olm, Raymond S Eachus. Deflects and the photographic process [J]. Radiation Effects and Defects in Solid, 1999,150: 71-78.

二级参考文献10

  • 1Cao Z X, Guo J D, Wang E G, Liu F Q 1999 Chin. Phys Lett. 16 928
  • 2Beutel J 1975 J. Appl Phys. 46 4649
  • 3Kaneda T1989 J. Imag. Sci. 33 115
  • 4Ehrllch S H 1994 J. Imag. Sci. Tech. 38 201
  • 5Hasegawa A and Sakaguchi T 1986 J. Imag. Sci. 30 13
  • 6Harada T, Lijima T and Koitabashi T 1982 Photogr. Sci.Eng. 26 137
  • 7Kellogg L M 1974 J. Photogr. Sci. Eng. 18 378
  • 8Milssig T 1997 J. Imag. Sci:. Tech. 41 118
  • 9Mussig T.Hegenbart G 1994 J. Imag. Sci. Tech. 38 526
  • 10Belloni J, Treguer M, Hynd R et al 1999 Nature 402 865

共引文献15

同被引文献16

  • 1王荣琴,彭必先.溴碘化银核壳乳剂中电子的捕获和复合[J].感光科学与光化学,1994,12(3):252-258. 被引量:2
  • 2王荣琴,彭必先.还原增感中心的本性及其增感机理[J].感光材料,1995(6):6-9. 被引量:2
  • 3米斯C E K,詹姆斯T H.照相过程理论[M].北京:科学出版社,1979.249-320.Mees C E K,James T H.The Theory of the Photographic Process[M].Beijing:Science Press,1979.249-320.
  • 4Sajio Hiroshi,Shiojiri Makoto.Island Formation and Layer Growth of Photosensitizing Dye J-Aggregates on AgBr Microcrystals Growth in Gelatin[J].Imaging Science and Technology,1997,41(3):266.
  • 5West W,Carroll B H,Whitcomb D H.The Adsorption of Sensitizing Dyes in Photographic Emulsions[J].J.Phys.Chem,1952.,56(9):1054.
  • 6Shunji Takada,Tadaaki Tani.Ionic Conduction of Silver Bromide Emulsion Grains as Affected by Dye Adsorption[J].Journal of Applied Physics,1974,45(11):4767.
  • 7Harry Hoyen A.Jr.Dielectric-loss Measurement of Interfacial Polarization at Silver Halide-Insulator Interfaces[J].Journal of Applied Physics,1976,47(9):3784.
  • 8Kanea T.A New Approach to Estimation of Depth of Electron Traps in AgBr Emulsion Grains on the Basis of the Gurney-mott Model[J].J.Imaging Sci.,1989,33(4):115.
  • 9Yang Shaopeng,Li Xiaowei,Han Li,Fu Guangsheng.Characteristics of Photoelectron Decay of Silver Halide Microcrystal Illuminated by a Short Pulse Laser.[J].Chin.Phys.Lett.,2002,19(3):429.
  • 10Li X W,Geng A C,Yang S P,et al.Measurement of the Time-resolved Spectrum of Photoelectrons from ZnS:Mn,Cu Luminescent Material[J].Chinese Physics Letters,2003.20(8) 1323.

引证文献3

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部