现代表面分析技术在半导体技术中的应用

The Application of Modern Surface Analysis Techniques in Semiconductor Technology

本文以国外半导体表面分析技术的最新发展状况,结合应用实例归纳为:常用的表面分析技术及其在线、在研制工作中的应用,以及开拓前景。对选用该技术的构思作了扼要介绍,最后指出,即使当分析技术已进入探知以原子数来计量的微区水平时,在分析技术领域中富有经验的谱学专家仍是不可缺少的。

In this paper, the recent developments of surface analysis techniques for semiconductor abroad have been reviewed with some examples. The usually used surface analysis techniques, their application on line and in trial-production as well as their development foresight are related. The conception ofoption of these techniques is introduced concisely. Finally, it is indicated that spectroscopists experienced in the analysis field are still necessary while the analysis technique already enters the area of micro amount which is counted by the number of atoms.