5MCNALLY J J, JUNGLING K C, WILLIAMS F L,et al. Optical coatings deposited using ion assisted deposition [J]. J Vac Sci Technol A, 1987, 5: 2145-2149.
6MARTIN P J, MACLEOD H A, NETTERFIELD R P,et al. Ion-assisted deposition of thin films[J]. Appl Opt, 1983, 22: 178-184.
7CHOW R, FALABELLA S, LOOMIS G E, et al, Reactive evaporation of low-defect density hafnia [J]. Appl Opt, 1993, 32: 5567-5574.
8WALDORF A J, DOBROWOLSKY J A, SULLIVAN B T, et al. Optical coatings deposited by reactive ion plating [J]. Appl Opt, 1993, 32: 5583-5593.
9EMILIANI G, SCAGLIONE S. Properties of silicon and aluminum oxide thin films deposited by dual ion beam sputtering [J]. J Vac Sci Technol A, 1987, 5: 1824-1827.
10MARTIN P J, NETTERFIELD R P, SAINTY W G. Modification of the optical and structural properties of dielectric ZrO2 fdms by ion-assisted deposition[J]. J Appl Phys, 1984, 55: 235-241.