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sol-gel法制备多孔纳米SiO_2薄膜 被引量:6

Nano-porous Silica Films Prepared by sol-gel Granular Silica Sol
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摘要 以NH3·H2O为催化剂,用正硅酸乙酯(TEOS)溶胶–凝胶工艺制备纳米多孔二氧化硅薄膜.强碱催化使二氧化硅胶粒溶解度增大并增大了体系的离子强度;丙三醇的加入,与水解中间体结合,有效抑制了二氧化硅溶胶胶粒的长大;PVA(聚乙烯醇)对二氧化硅胶粒有强的吸附作用,使胶粒聚联成大的网络结构,增加了成膜性能.通过改变反应物的剂量,调节添加剂的用量,可以制得折射率1.18~1.42,对应孔率60.50%~7.75%并且孔径小于100 nm的纳米多孔二氧化硅薄膜,.单层薄膜厚度在3 μm以内精确可控. Homogeneous nanoporous silica films were prepared with colloidal silica sol derived by sol-gel technique of tetraethylorthosilicate(TEOS) catalyzed with NH3?H2O. Dense ammonia enhanced the colloidal solubility of silica and ion intensity; glycerol effectively restrained the growth of silica particles; and PVA adhered to silica particles to form a network, which make it easy to prepare silica films. The pore sizes is < 100 nm, the porousity is between 60.50%~7.75%. The refractive indexes of the silica films is between 1.18~1.42 and one layer of the silica films can be adjusted within 3 μm thick.
出处 《电子元件与材料》 CAS CSCD 北大核心 2005年第2期32-34,37,共4页 Electronic Components And Materials
基金 国家重点基础研究发展计划(No.2002CB613304) 上海市重点学科项目资助
关键词 无机非金属材料 多孔纳米二氧化硅薄膜 溶胶-凝胶工艺 孔率 厚度控制 SOL-GEL法 inorganic non-metallic materials nano-porous silica films sol-gel technique porousity: the adjustment of thick
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