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PLD法制备纳米类金刚石薄膜及衬底温度的影响 被引量:4

Synthesis of Nanoscale Diamond-like Carbon Films by PLD and the Dependence of Substrate Temperature
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摘要 利用脉冲激光沉积(PLD)技术在O2氛围下于α Al2O3(0001)基片上制备出纳米类金刚石薄膜。借助扫描电子显微镜(SEM)、原子力显微镜(AFM)和Raman光谱分析了薄膜的形貌和结构随沉积时衬底温度的变化情况。结果表明:随着衬底温度的升高,薄膜颗粒尺寸减少;在衬底温度为550℃时,所制备的薄膜均匀、光滑,且大约是由14nm大小的颗粒组成。对薄膜的生长机理作出了分析。 Nanoscale diamond-like thin films on the α-Al_2O_3 substrates were prepared by pulsed laser deposition(PLD) technique using O_2 gas.The microstructures and micrographs of the carbon films were studied by scanning electron microscopy(SEM),atomic force microscopy(AFM) and Raman spectroscopy,respectively.The evolution of microstructure and micrograph with the variation of substrate temperature was given.The effects of substrate temperature were also investigated on preparation of nanoscale diamond-like thin films.As a result,the grain size is reduced with the substrate temprature rising.The surface of thin films by pulsed laser deposition at 550 ℃ is uniformity and lubricity and an average size of 14 nm was formed.The possible diamond-like growth mechanism by PLD in an oxygen environment was discussed.
出处 《光电子.激光》 EI CAS CSCD 北大核心 2004年第12期1456-1459,1463,共5页 Journal of Optoelectronics·Laser
基金 湖南省教育厅基金资助项目(02C574)
关键词 衬底温度 类金刚石薄膜 脉冲激光沉积 RAMAN光谱分析 基片 生长机理 形貌 制备 纳米 Α-AL2O3 nanoscale diamond-like thin film pulsed laser deposition(PLD) substrate temperature growth mechanism
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