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低位错InAs单晶的研制 被引量:2

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作者 汪鼎国
出处 《四川有色金属》 1993年第2期39-41,共3页 Sichuan Nonferrous Metals
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  • 1崔玉成.LEC法生长砷化铟单晶[J].稀有金属,1996,20(3):239-240. 被引量:2
  • 2赵有文,孙文荣,段满龙,董志远,杨子祥,吕旭如,王应利.高质量InAs单晶材料的制备及其性质[J].Journal of Semiconductors,2006,27(8):1391-1395. 被引量:4
  • 3Jacob G,Duseaux M,Farges J P,et al.Dislocation-free GaAs and InP crystals by isoelectronic doping.J Cryst Growth,1983,61:417
  • 4Oda O,Katagiri K,Shinohara K,et al.Semiconductors and Semimetals,1990,31:93
  • 5Gottschalk H,Patzer G,Alexander H.Stacking fault energy and ionicity of cubic Ⅲ-Ⅴ compounds.Phys Status Solidi A,1978,45:207
  • 6Yonenaga I.Dynamic behavior of dislocations in InAs:In comparison with Ⅲ-Ⅴ compounds and other semiconductors.J Appl Phys,1998,84:4209
  • 7Allwood D A,Mason N J,Walker P J.In situ characterisation of MOVPE by surface photoabsorption Ⅰ:substrate oxide desorption.J Cryst Growth,1998,195:163
  • 8Gao Yuzhu,Gong Xiuying,Gui Yongsheng,et al.Electrical properties of melt-epitaxy-grown InAs0.04 Sb0.96 layers with cutoff wavelength of 12μm.Jpn J Appl Phys,2004,43:1051
  • 9Gong Xiuying,Kan Hirofumi,Makino Takamitsu,et al.Room temperature mid-infrared light-emitting diodes from liquid-phase epitaxial InAs/InAs0.89Sb0.11/InAs0.80P0.12-Sb0.08 heterostructures.Jpn J Appl Phys,2000,39:5039
  • 10Gao Yuzhu,Yamaguchi Tomuo,Gong Xiuying,et al.InNAsSb single crystals with cutoff wavelength of 11~13.5μm grown by melt epitaxy.Jpn J Appl Phys,2003,42:4203

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