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Modeling Quantum Transport in Nanoscale Vertical SOI nMOSFET

Modeling Quantum Transport in Nanoscale Vertical SOI nMOSFET
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摘要 The electron transports in micro-architecture semiconductor are simulated using vertical SOI nMOSFET with different models. Some details in transport can be presented by changing channel length, channel thickness and drain voltage. An interesting phenomenon similar to collimation effect in mesoscopic system is observed. This may suggest the quite intriguing possibility that scattering may open new channel in sufficiently narrow devices. Key words semiconductor - MOSFET - transport - mesoscopic system CLC number TN 303 - TN 304 Foundation item: Supported by the National Defense Foundation of China(99J2. 4. 1. JW0514)Biography: TONG Jian-nong(1961-), male, Ph. D candidate, Senior engineer, research direction: IC design. The electron transports in micro-architecture semiconductor are simulated using vertical SOI nMOSFET with different models. Some details in transport can be presented by changing channel length, channel thickness and drain voltage. An interesting phenomenon similar to collimation effect in mesoscopic system is observed. This may suggest the quite intriguing possibility that scattering may open new channel in sufficiently narrow devices. Key words semiconductor - MOSFET - transport - mesoscopic system CLC number TN 303 - TN 304 Foundation item: Supported by the National Defense Foundation of China(99J2. 4. 1. JW0514)Biography: TONG Jian-nong(1961-), male, Ph. D candidate, Senior engineer, research direction: IC design.
出处 《Wuhan University Journal of Natural Sciences》 EI CAS 2004年第6期918-920,共3页 武汉大学学报(自然科学英文版)
基金 theNationalDefenseFoundationofChina(99J2 .4.1 .JW0 51 4 )
关键词 SEMICONDUCTOR MOSFET transport mesoscopic system semiconductor MOSFET transport mesoscopic system
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