高阻隔碳氢膜的制备及性能研究

Study on the preparation of high barrier hydrogenated carbon film and its properties

利用射频等离子体化学气象沉积法 (r.f.PECVD) ,在 12 μm厚的聚对苯二甲酸乙二醇酯 (PET)上制备了碳氢膜 .用原子力显微镜 (AFM) ,x射线光电子能谱 (XPS) ,激光拉曼光谱 ,傅里叶红外光谱等仪器 ,对碳氢膜的表面形貌和内部结构特性进行了较详细研究 .镀碳氢膜PET的阻隔性能在标准透水蒸气测试仪上进行检测 .实验结果证明 :沉积工艺参数对碳氢膜的生长速率及结构性能有重要影响 ;在PET上沉积的是纳米碳氢膜 ,该膜主要由sp2 和sp3杂化的碳氢化合物组成 ;当PET上碳氢膜厚度为 90 0nm时 ,阻水蒸气性能可提高 7倍 .

Hydrogenated carbon thin films were fabricated on the surface of polyethylene terepthalate(PET) by radio frequency plasma enhanced chemical vapor deposition (r. f. PECVD). The film structure properties were studied by means of atomic force microscope(AFM), x-ray photo-electron (XPS), laser Raman spectroscopy, Fourier-transform infrared spectra(FTIR) etc. The barrier property of the film was conducted on the water vapor permeation instrument. The results show that nano-hydrogenated carbon films have been deposited on PET surface and they are mainly composed of sp(2) and sp(3) hybridized hydrogenated carbon compounds. Plasma parameters influence the films' growth rate and structure characteristics. The film reduces the water vapor permeation ratio of the PET by 7 times at a film thickness of only 900nm.