热解CVD法生长金刚石薄膜

The Growth of Diamond Thin Films by Thermal CVD

本文以有机低分子化合物和氢气为反应气体,用热解 CVD 法生长出金刚石多晶薄膜。用喇曼散射、X 射线衍射、反射高能电子衍射和电子显微镜等方法进行了结构表征。论述了碳源浓度、热丝温度、基片温度和预处理工艺对金刚石薄膜结构和性能的影响。

Diamond thin films(DTF)were prepared by thermal chemicalvapor deposition(thermal CVD),using gasous organic compounds andhydrogen as the reaction gas.The structure of the film was characterized byRaman scattering,X-ray diffraction,reflection high energy electron diffractionand scanning electron microscopy.The influences of carbon concentrations,filament temperatures,substrate temperatures and pre-treatments on theproperties and structure of the film are discussed.