摘要
研究了研磨剪切作用对聚醚多元醇插层的蒙脱土片层结构的影响。研究发现,随着研磨时剪切应力强度和研磨次数的增加,有机蒙脱土的层间距从2.8nm逐渐扩大到5.6nm左右,直至(001)面衍射峰消失。聚醚种类对蒙脱土的片层结构也有一定影响。由此制备的聚醚多元醇/蒙脱土纳米复合物可用于本体法合成聚氨酯/蒙脱土纳米复合弹性体。
In this paper, the organo-montmorillonite(OMT) have been found exfoliated in the poly(propylene glycol)(PPG) by the function of shear stress of cone grinder confirmed by the XRD. The results indicate that enough residence times and intensity of shear is required to facilitate the exfoliation and dispersion of layered silicates. The novel way provides us a new and practical method to synthesis PU/clay nanocomposites because exfoliated structure can be obtained and no solvents are required.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
2005年第1期191-194,共4页
Polymer Materials Science & Engineering
关键词
聚氨酯
蒙脱土
插层
纳米复合
nanocomposite
polyurethane
montmorillonite
