Co/Cu纳米多层膜的制备及巨磁阻性能的研究

Study of giant magnetoresistence of Co/Cu multilayers prepared by electrochemical deposition

采用恒电位双电解槽法在硼酸镀液体系中,以单晶 Si(111)为基底电沉积制备 Co/Cu多层膜,确定了双槽法制备多层膜的工艺条件,为得到优良的多层膜巨磁阻材料,镀液体系中加入了自制的添加剂。并用扫描电镜(SEM)表征了多层膜的断面形貌,小角度X射线衍射(LXRD)谱图中出现了 2 个衍射峰,大角度X射线衍射(MXRD)谱图中强衍射峰的两侧出现了卫星峰,表明多层膜具有超晶格结构。用物性测量系统( PPMS )测试了 Co/Cu 多层膜的巨磁阻(GMR)性能,GMR值达到52.52%。

Co/Cu multilayers were prepared by using double-bath method containing boric acid solution. The technological conditions were determined by cathodal polarization curves of Si(111) electrode in plating solution with different concentration of Cu2+ or Co2+. Two diffraction peaks in the LXRD indicated that the multiplayer has periodic structure, and satellite peaks in the MXRD patterns indicate that the multilayer has formed a superlattice structure. Which was confirmed by cross-section SEM image of Co/Cu multilayers, in addition, GMR measured by physical property measure system was high up to 52.52%.