摘要
采用射频磁控溅射的方法,在不同条件下制备了氧化钒薄膜样品,分别在不同温度条件下做了退火处理,并对退火前后样品做了X射线衍射(XRD)、X射线光电子能谱(XPS)和激光扫描共聚焦显微镜测试与分析,旨在得出制备良好的V2O5 薄膜的条件。
Vanadium oxide thin film samples were prepared by R.F. magnetron sputtering methods in different conditions. The samples were annealed at different temperatures. The thin film samples before and after annealing were all studied with XRD, XPS and laser scanning confocal microscope, in order to find the conditions preparing good V2O5 films.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2005年第2期285-287,共3页
Journal of Functional Materials
基金
福建省自然科学基金资助项目(E0110004)
国家自然科学基金重大研究计划资助项目(90206039)
国家重点基础研究发展规划资助项目(001CB610505)
关键词
射频磁控溅射
氧化钒薄膜
XRD
XPS
激光扫描共焦显微镜
Magnetron sputtering
Oxides
Thin films
Vanadium compounds
X ray diffraction analysis
X ray photoelectron spectroscopy
