交流电沉积制备SnO_2纳米线及其电沉积条件研究

Preparation of SnO_2 Nanowires by AC Electrodeposition in Anodic Alumina Template and Its Deposition Conditions

采用阳极氧化的方法制备了孔径为30-50nm多孔阳极氧化铝(AAO)模板,用交流(AC)电沉积法在氧化铝模板孔洞内沉积金属锡,然后在空气中750℃加热含锡的模板10h,热氧化制备了直径在30-50nm SnO2纳米线.用扫描电子显微镜,透射电子显微镜,X射线衍射仪对所制备的SnO2纳米线进行了表征,表明所制备的纳米线为多晶结构.并通过改变交流电沉积过程中的电压,频率和热氧化时间来考察不同沉积条件对沉积结果的影响,发现采用交流沉积制备金属纳米线的过程中,频率和电压是影响沉积结果的关键因素.

By using the anode oxidation method, porous alumina anode oxidation templates (AAo) with a pore diameter of 30similar to50nm were prepared, and metal tin nanowires electrodeposited in the pores of AAO, then the AAO with tin nanowires annealed in muffle in air at 750degreesC for 10h, and SnO2 nanowires formed. The effects of electrodeposition conditions, such as frequency, voltage, on the filling ratio of tin were also studied. SEM, TEM, XRD results show that these polycrystalline SnO2 nanowires have a diameter of 30similar to50nm, voltage and frequency are the key factors affecting the electrodeposition results.