摘要
线状离子源适合于大面积材料的连续溅射改性过程。多极场设计技术在3×20cm线状离子源的放电室中有很好的应用。
A rectangular-beam ion source that is particularly suited for the cotinuous sputter processing of materials over a wide area. Multipole design tecniques that are basically flexible as to dicharge chamber shape were nsed to design an ion source with a 3 × 20cm beam area.
出处
《微细加工技术》
1993年第3期39-42,共4页
Microfabrication Technology
