摘要
在以前还只是处于想象境地的抗蚀剂干显影(等离子体显影)已展示了实现的可能性。一方面开发了能够干显影的抗蚀剂,另一方面还发展了能对现有抗蚀剂作干显影的新工艺。本文简述了至今为止所发表的抗蚀剂的干显影技术方法和技术动向,也介绍了我们所做的有关工作。
Photoresist dry development (plasma development) imagined by people before now shows its possibility with photoresist for dry development and new process of dry development for present photoresist. The photoresist dry development technique and its trend which have been issued and the work we have done to them are introduced in this paper.
出处
《微细加工技术》
1993年第4期29-34,共6页
Microfabrication Technology
