α-C:H薄膜及其在硅太阳电池上作增透膜的研究

INVESTIGATION OF a-C:H FILMS DEPOSITED ON SILICON SOLAR CELL AS ANTIREFLECTIVE COATING

采用高频等离子体汽相淀积法在不同材料衬底上淀积出α-C:H薄膜。Raman谱分析表明,该薄膜既具有类金刚石相,又具有金刚石相。测量了该薄膜可见光范围的透射率和折射率。本文提出把该薄膜涂覆在硅太阳电池上作光学增透膜,使其在0.55—1.0μm波长范围内光谱响应明显提高,并使该电池短路电流增加率达38％。

α-C:H films produced on various substrate materials by using radio frequency plasma vapor deposition method have been analysed by Raman spectroscopy, indicating both diamond-like and diamond phases appear in these films. After analysing the transmittance and the refractive index of the films in the visible range, we suggest that the deposited film on silicon solar cell can be used as antireflective coating. The spectrum response value of the solar cell can be improved obviously over a wide range of wavelength from 0.55 to 1.0 μm and the short-circuit cxurent(lsc) of the solar cell is increased by 38% over the uncoated ones.