摘要
给出了W/B4C、W/C、W/Si(钨/碳化硼、钨/碳、钨/硅)周期多层膜的制备和测量研究.用超高真空直流磁控溅射方法制备出周期在1.1～7.2 nm范围内的多层膜样品,采用X射线衍射仪(XRD)小角度测量方法检测多层膜的光学性能,并用透射电镜(TEM)对样品的微观结构进行了研究.结果表明:周期大于1.3 nm的多层膜样品的结构质量高,膜层结构清晰,界面粗糙度小;周期为1.15 nm的多层膜的膜层结构不是很明显;所有膜层均为非晶态,没有晶相生成.结果还表明:采用目前的溅射设备和工艺过程能够制备出满足同步辐射荧光光束线上单色器用多层膜.
The new material combination of W/B4C, W/C, W/Si is investigated, mainly including multilayer's fabrication and characterized measurements. These multilayers have been fabricated using a high vacuum DC magnetron sputtering, which have the periods in the range of D = l.1-7.2 nm. The optical characterization of the multilayers is measured using X-ray diffraction (XRD), and the microstructure of the multilayers is measured using transmission electron microscope (TEM). The results show that the quality of the samples with a period of larger than 1.3 nm is high, the interfaces of the layers are sharp, and the roughness is small; but the interfaces of the multilayer with 1.15 nm period are blur; all coatings are amorphous phases and no crystallization are found. These multilayers fabricated using the magnetron sputtering system and the processing parameters can meet the requirement of the X-ray fluorescence analysis and synchrotron radiation monochromator.
出处
《光学精密工程》
EI
CAS
CSCD
北大核心
2005年第1期28-33,共6页
Optics and Precision Engineering
基金
国家自然科学基金资助(No.10435050 60378021)
863 804 7资助项目
关键词
多层膜
X射线衍射仪
同步辐射
透射电镜
Boron carbide
Carbon
Magnetron sputtering
Microstructure
Multilayers
Optical properties
Silicon
Synchrotron radiation
Transmission electron microscopy
Tungsten
X ray diffraction analysis
