摘要
用光激发电子显微镜研究了Fe/Ni铁磁膜和Co/Cu/Fe/Ni磁耦合膜中的条纹磁畴. 实验发现:在Fe/Ni体系中,条纹磁畴宽度随着铁层厚度趋近于自旋转向相变点呈指数下降;在Co/Cu/Fe/Ni体系中,Fe/Ni层中的条纹磁畴会沿着钴层磁矩的方向排列,其磁畴宽度会随着Co-Fe/Ni间的层间耦合强度呈指数下降. 理论上推导出条纹磁畴随着磁各向异性能和层间耦合强度变化的统一公式,而实验结果与理论符合得非常好.
Magnetic stripe domains in the spin reorientation transition region are investigated in (Fe/Ni)/Cu(001) and Co/Cu/(Fe/Ni)/Cu(001) using photoemission electron microscopy. For the former, the stripe domain width decreases exponentially as the Fe/Ni film approaches the transition point. For the latter, the Fe/Ni stripe orientation is aligned with the Co in-plane magnetization and the domain width decreases exponentially with increasing of the interlayer coupling between the Fe/Ni and Co films. By considering magnetic stripes within an in-plane magnetic field, we reveal a universal dependence of the stripe domain width on the magnetic anisotropy and on the interlayer coupling.
出处
《物理》
CAS
北大核心
2005年第2期104-108,共5页
Physics
关键词
自旋
磁畴
磁膜
磁矩
耦合强度
指数
相变
体系
旋转
排列
Photoemission electron microscopy, Magnetic stripe domain, Spin reorientation transition, Interlayer coupling
