摘要
以CH4 和CF4 的混合气体作源气体 ,利用等离子体增强型化学气相沉积法 (PECVD)改变沉积条件 ,制备了一批含氟碳化膜样品。并用原子力显微镜 (AFM)、X射线衍射、红外光谱、紫外一可见光等设备分析了薄膜的表面形貌和微观性能。
Fluorinated carbon films were deposited by PECVD using CH 4 and CF 4asa source gases at varying deposition conditions.X-ray diffraction, atomic force microscope(AFM), XRD spectrum UV-VIS (Uitraviolet Visible Spectrometry)were applied to analyze the Fluorinated carbon film's construction and its microcapabilities.
出处
《湖南理工学院学报（自然科学版）》
CAS
2004年第4期62-65,共4页
Journal of Hunan Institute of Science and Technology(Natural Sciences)
