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温梯法白宝石晶体的表面形貌研究 被引量:1

Study on Surface Morphology of Sapphire Crystal Grown byTemperature Gradient Technique(TGT)
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摘要 本文采用导向温梯法 (TGT)生长 [0 0 0 1 ]方向的白宝石晶体 ,利用气相传输平衡 (VTE)技术对晶体表面进行处理 ,发现双面抛光的C面白宝石晶片高温下与富锂 (Li2 O蒸气 )气氛发生反应 ,表面生成一层γ LiAlO2 ,随着VTE反应温度从 75 0℃下降到 730℃ ,γ LiAlO2 晶核的颗粒也随着减小 ,在 730℃时已在 1 μm以下 ,经稀盐酸 (HCl)腐蚀后形成多孔的表面 。 High quality sapphire crystal oriented along [0001] was grown by the temperature gradient technique (TGT) and subsequently was fabricated into well double-polished (0001) sapphire wafers. These (0001) sapphire wafers were processed by vapor transport equilibration (VTE) technique under high temperature and in Li-rich ambient. As a result, a single-phase γ-LiAlO2 layer was formed on wafer surface. The sizes of γ-LiAlO2 grains decreased with the drop of VTE process temperature from 750°C to 730°Ct. In the case of 730°C, the sizes of γ-LiAlO2 grains were already under 1 μ. Above-mentioned sapphire wafers with γ-LiAlO2 grains were then subjected to dilute muriatic acid (HCl), so γ-LiAlO2 grains were etched and removed, thus brought a froth porous surface. It is promising to fabricate porous substrates by VTE technique for GaN epitaxial growth.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2004年第6期882-886,共5页 Journal of Synthetic Crystals
关键词 温梯法 晶体 表面形貌 气相 衬底 多孔 晶核 白宝石 LiAlO2 反应温度 sapphire crystal temperature gradient technique (TGT) vapor transport equilibration (VTE) porous surface GaN porous substrates
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参考文献6

  • 1周国清,徐科,邓佩珍,徐军,周永宗,干福熹,朱人元.温梯法生长φ110mm×80mm蓝宝石晶体位错的化学腐蚀形貌分析[J].硅酸盐学报,1999,27(6):727-733. 被引量:14
  • 2Shengming Zhou, Jun Xu, Shuzhi Li, et al. Highly a-axis Oriented γ-LiAlO2 Layer on a-plane Sapphire Fabricated by Vapor Transport Equilibration[J].Phys. Stat. Sol.(a),2004,201(7):R35-R37.
  • 3Yun F, Reshchikov M A, He L, et al. Growth of GaN Films on Porous SiC Substrate by Molecular-beam Epitaxy[J]. Appl. Phys. Lett. ,2002, 81:4142.
  • 4Ashutosh Sagar, LeeC D, Feenstra RM, et al. Plasma-assisted Molecular Beam Epitaxy of GaN on Porous SiC Substrateswith Varying Porosity[J]. J.Vac. Sci. Technol . ,2003 , B21: 1812.
  • 5Liu L,Edgar J H. Substrates for Gallium Nitride Epitaxy[R]. Materials Science and Engineering,R: Reports,2002,37(3):61-127.
  • 6SaddowS E, MynbaevaM, SmithMCD, et al. Growth of SiC Epitaxial Layers on Porous Surfaces of Varying Porosity[J].Applied Surface Science 2001,184: 72-78.

二级参考文献5

  • 1南京大学地质学系岩矿教研室.结晶学与矿物学[M].北京:地质出版社,1978.333.
  • 2Blair D,Opt Mater,1997年,8卷,233页
  • 3侯印春,光功能晶体,1991年,117页
  • 4南京大学地质学系岩矿教研室,结晶学与矿物学,1978年,333页
  • 5徐建卫,周永宗,周国清,徐科,邓佩珍,徐军.温梯法大尺寸白宝石单晶的生长[J].人工晶体学报,1998,27(3):242-245. 被引量:21

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  • 1韩杰才,左洪波,孟松鹤,张明福,姚泰,李长青,许承海,汪桂根.泡生法制备大尺寸蓝宝石单晶体[J].人工晶体学报,2005,34(1). 被引量:21
  • 2张克从.近代晶体学基础(下册)[M].北京:.科学出版社,1998,71.
  • 3张克从,张乐惠.品体生长与技术(下册)[M].北京:科学出版社,1997,405—407.

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