摘要
全面垂直层流洁净室气流组织的三个参数 (不均匀性NU、通风效率Ea、流线平行度 )影响着芯片的成品率。本文从以下方面论述了洁净室的气流组织的影响因素 :送风方式、洁净度不同的速度介面、洁净室内设备及操作人员、洁净室的地板和盲板、灯具、缝隙等 。
There are three parameters playing important role in the efficiency of CMOS chip production: Non-Uniformity,the air-change efficiency,air-flow parallelism.In order to research the deterministic simulation about unidirectional cleanroom,the factors that affect the air-flow performance of unidirectional cleanrooms such as the method of supply air ,the face velocity of different cleanliness level ,the devices and operators in the cleanrooms, floor,blank plate,lamps,aperture etc are discussed,which can help carry on exact analysis in the future.
出处
《制冷与空调》
2005年第1期12-16,共5页
Refrigeration and Air-Conditioning
基金
国家重点基础研究发展规划项目 (G2 0 0 0 0 2 63 0 3 )
