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新型液态光致抗蚀剂 被引量:1

Preparation and application of new liquid photoresist
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摘要 液体光致抗蚀剂由活性齐聚物、活性单体、颜料、添加剂和光敏引发剂组成。通过分析各组分的选 择及其作用和性能,采用聚苯乙烯 顺丁二烯二酸酐树脂为齐聚物,高沸点乙烯化合物为活性单体,合成了 JR110照相雕刻制版感光胶。该文介绍了JR110的性能及其在印花辊筒雕刻工艺上的应用。 Liquid photoresist consists of living oligomer, living monomer, additive and photoinitiator. The selection principle and functions of various components are introduced. Photogelatin for JR110 photographic engraving and stenciling is synthesized with polystyrene-cis butadiene dicarboxylic anhydride resin as oligomer, high boiling point ethylene compound as living monomer, its application performance in roller engraving is also introduced.
出处 《印染》 北大核心 2005年第5期29-31,共3页 China Dyeing and Finishing
关键词 滚筒印花 雕刻(印花) 感光材料 应用 cylinder printing engraving photosensitive material apply
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