摘要
采用热灯丝CVD、分次连续沉积的办法在硅衬底上制备金刚石膜.用RAMAN光谱、X ray衍射、扫描电子显微镜(SEM)等多种技术对金刚石膜的形貌、成份、晶态等特性进行了分析,证实所获膜质量较好.
In order to get a thick diamond film, at the same condition the same silicon is used to deposited. Raman spectrum, X-ray spectrum and SEM are used to study the film produced by HFCVD. The film has the well-defined facet.
出处
《天津理工大学学报》
2005年第1期41-42,57,共3页
Journal of Tianjin University of Technology
基金
天津市自然科学基金资助项目(023602511).
