摘要
在DDF-I电子枪基础上,改变电子枪结构,将G5分成三部分,保持G52/G53之间的四极场,增加G51/G52之间的四极场,通过改变四极场位置和电子束在主透镜的入射角来减小四角电子束的水平尺寸。调整G51/G52之间水平翼片的长度,让四极场场强达到合适的值,使屏面中心和四角的光点尺寸同时达到最佳。通过反复模拟计算和实验测试,最终确定了能获得满屏良好聚焦性能的DDF-II电子枪结构。
Based on DDF- I electron gun, we changed its structure by splitting G5 electrode into three parts. In the new structure, a new quadrupole between G51 electrode and G52 electrode was added and the quadrupole between G52 electrode and G53 electrode was reserved. The horizontal size of corner electron beam could be reduced by adjusting the position of the quadrupole and the incidence angle of electron beam in main lens. The spot sizes in the screen's center and corner could come to the best at the same time when we adjusted the length of the horizontal-slot between the G51 electrode and G52 electrode for appropriate quadrupole. Through numerous simulation and experiments, a kind of DDF- n gun's structure by which better focus performance in full screen could be got was gained.
出处
《真空电子技术》
2003年第6期21-25,共5页
Vacuum Electronics
关键词
电子枪
四极场
像散
动态聚焦
光点尺寸
Electron gun
Quadrupole
Astigmatism
Dynamic Focus
Spot size