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光栅干法刻蚀与湿法刻蚀的研究 被引量:2

Research on Dry-Etching Gratings and Wet-Etching Gratings
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摘要 在光栅的制作中有两种方法:其中一个是湿法,另外一个是干法。本文分别就湿法和干法的实验结果,进行比较。用于法刻蚀方法做出了比较好的一级光栅,证明了干法刻蚀优于湿法刻蚀。 There are two ways in fabricating grating1 one is wet-etching, the other is dry-etching. In this paper, the two methods will be compared in the last ,we have fabrticated 1st order grating usingdry etching.
出处 《光学与光电技术》 2003年第1期54-56,共3页 Optics & Optoelectronic Technology
关键词 分布式布拉格反馈 干法腐蚀 反应离子刻蚀 全息光刻 DFB dry-etching reactive ion etching holographic lithography
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  • 1[1]T.Saitoh, O.Mikamid. "NEW CHEMICAL ETCH-ING SOLUTION FOR InP AND GaIAsP GRAT-INGS". Electronnics Letters. 1982, 18(10): 408-410
  • 2[2]P.Daste, Y.Miyake."FABRICATION TECHNIQUE FOR GAINASP/INP QUANTUM WIRE STRU-CTURE BY LP-MOVPE". Journal of Crystal Growth.. 1988, 93: 365-369
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  • 4[4]Antoni S.Gozdz and Paul S.D.Lin,"SIMULATION AND FAST E-BEAM NAN FABRICATION OF PERIODIC STRUCTURES". Microelectronic Engineering. 1989, 9: 529-532
  • 5[5]Yoshiaki Watanabe, Nong Chen,Member. IEEE et al. "LATER ALL COUPLED STRAINED MQW RIDGE WAVEGUIDE DISTRIBUTED-FEEDBACK LASER DIODEFABRICATED BY WET-DRY HYBRID ETCHING PROCESS", IEEE Photonics Technology Letter, 1998, 10,(12): 1688-1690
  • 6[6]N.Aberkanc, B.Thedrez."VERY LOW THRESHOLD CURRENT DENSITY GSMBE 1.55UM GAIN-COUPLE DFB LASERS", ElectronicsLetters, 1998, 34(5): 464-465

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