摘要
论述了磁控溅射薄膜的厚度分布,从理论上分析了固定基体、基体转动和自转加公转三种状态下的膜厚分布.计算表明,膜厚分布很大程度上取决于基体高度.适当调节基体高度和靶的距离,可以得到很好的膜厚均匀性.实验证实了这个结果.
Thickness distribution of thin films deposited with magnetro-sputtering is studied in this paper. Theoretical analysis tand value calculation are conducted under three conditions when the substrate is fixed; when the substrate is rotating; and both the substrate and the workshelf are rotating. It is shown that the distribution mainly depends on the highness of the substrate. Very uniform thin film is deposited on the substrate by adjusting the highness of the substrate and and distance between the target and the rotating center, as proved by experiments.
出处
《应用科学学报》
CAS
CSCD
1993年第2期136-140,共5页
Journal of Applied Sciences
关键词
磁控溅射
薄膜
厚度
magnetro-sputtering, thin film, thickness
