摘要
ZrO2 thin films were deposited by r.f. reactive unbalanced magnetron sputtering. The influence of electromagnetic coil current on microstructure and optical properties of the films was investigated. At low coil current of 0.2A, small grains are produced. With the increase of coil current, the deposition rate and surface roughness are decreased and the packing density in proportion to the refractive index is increased remarkably. The refractive index is as high as 2.236 (at X=600nm) at 0.4A. At the high coil current of 0.6A, grains appear to grow up due to thermal effects and therefore optical properties of the films are deteriorated a little.
ZrO2 thin films were deposited by r.f. reactive unbalanced magnetron sputtering. The influence of electromagnetic coil current on microstructure and optical properties of the films was investigated. At low coil current of 0.2A, small grains are produced. With the increase of coil current, the deposition rate and surface roughness are decreased and the packing density in proportion to the refractive index is increased remarkably. The refractive index is as high as 2.236 (at X=600nm) at 0.4A. At the high coil current of 0.6A, grains appear to grow up due to thermal effects and therefore optical properties of the films are deteriorated a little.
出处
《材料热处理学报》
EI
CAS
CSCD
北大核心
2004年第05B期814-817,共4页
Transactions of Materials and Heat Treatment
基金
supported by the“985”program of the Ministry of Education
关键词
ZRO2薄膜
不平衡磁控管溅射
显微结构
光学性质
zirconium oxide, unbalanced magnetron sputtering, microstructure, optical property
