摘要
研究了PCVD法在电工钢上沉积Si的规律及其电磁性能,探讨了处理温度对表层中硅含量的影响。本底Si含量0.5%;厚0.15mm的电工钢经PCVD处理后磁性能得到极大改善,高温扩散后其铁损P_(10/50)下降了55%,P_(15/50)下降了66.2%,磁感应强度B_(5000)提高了5.42%。
This paper deals with PCVD Si - deposited layetof silicon steel sheets and its electromagnetic properties.The influence of treating temperature on the layer is stud-ied. The properties of the treared sheets are improved.After diffusing at 1150℃ the core loss of the sheets treat-ed by PCVD Si - deposition reduces more about 55 % andtheir flux density increases 5. 42 %.
出处
《表面工程》
CSCD
1997年第3期11-12,共2页