摘要
采用现场电化学紫外-可见反射光谱法研究了含亚硒酸的1.0mol.L-1H3PO4溶液中铜电极表面的成膜机理。实验结果并结合热力学分析证实了成膜过程中直接氧化机理的存在。
In this paper the film - forndng mechanism of CuSe on copper electrode in 1. 0mol· L-1 H3PO4 c0ntaining H2SeO3 was studied by using in situ electrochendcal ultraviolet-visiblerenectance spetroscopy. The results combined with thermedpoamic analysis confirmed the exis-tence of direct-okidizing mechanism.
出处
《化学研究》
CAS
1997年第4期22-25,共4页
Chemical Research
基金
国家自然科学基金