摘要
本文介绍了采用分立型复合溅射靶制造 EL 薄膜的工艺。用这种方法可严格控制 EL 薄膜的化学计量及掺杂含量,并使掺杂物在薄膜里呈梯度分布。
This article relates to a sputtering process for producing EL films by adopting a plurality of discrete sputtering targets.Thus the stoichiometry and doping levels of the above EL films can be closely controled and a graded dopant profile can be provided in the films.
出处
《真空电子技术》
北大核心
1993年第4期40-42,共3页
Vacuum Electronics
关键词
EL薄膜
溅射工艺
掺杂物
场致发光显示器
EL film
sputtering process
a plurality of discrete sputtering targets
doping level
a graded dopant profile