Ta-10W溅射涂层性能与工艺关系的研究

Investigation of Deposition Condition on the Properties of Ta-1W Films Deposited by Sputtering

本文利用 Ｒ·Ｆ溅射技术在炮钢基上沉积Ｔａ－１０Ｗ合金薄膜，运用 ＸＰＳ、ＸＲＤ和划痕等测试手段对薄膜的成份、晶体结构及附着力进行了全面的研究。结果表明： Ｒ·Ｆ溅射Ｔａ－１０Ｗ合金薄膜的Ｔａ·Ｗ相对含量比基本与靶相同。薄膜中氧含量随氩气压强的增加或对基片施加正偏压而增加．薄膜的附着力与 Ｔａ－１０Ｗ相结构有关，提高沉积温度对薄膜的附着有利。

The Ta-10w alloy.,films on gun steel have been deposited by R.F sputtering technique. The composition crystal structure microstracture and ad hesion have been carefully investigated by useing XRD and scratch test method results showed:the composition of films is same as that of target. The amount of oxygen in films increases with Ar gas pressure or when the substrate bias changes from negative to positive the adhesion of films is related to crystal structure.The adhesion of films to the substrate will be enhancedunder higher tqmperature.