全元素离子注入及应用

Injection and Application of Total Element Ion

ＴＩＴＡＮ离子源是一种新的能够同时产生强金属和气体离子束流的离子源。利 用它我们已经得到了 Ａｌ、Ｔｉ、Ｔａ、Ｃｒ、Ｆｅ、Ｃｏ、Ｎｉ、Ｚｎ、Ｓｎ、Ｙ、Ｃ、Ｓｉ、Ｈｅ、Ｎ、Ａｒ等气 体和金属元素离子束。利用阴极斑真空弧可以获得金属离子，利用气体集中弧放电获得 气体离子，引出电压为 １０～８０ｋＶ，气体和金属离子脉冲流强分别为 ０．２５Ａ 和 ０．５０Ａ， 工作频率为 １０～５０ Ｈｚ，束斑面积 ２００ ｃｍ２。本文并对该离子源的离子注入应用做了介 绍。

TITAN ion source is a new ion source which can produce strong metal and gas ion beam. Use .it,Al.Ti,Ta,Cr,Fe,Co,Ni,Zn, Sn, Y, C, Si, He, N, Ar etc gas and metal element ion beam can be obtained. Metal ion can be obtained by cathode spot vacuum arc, and gas ion by gas coellective arc discharge. power: voltage 10-80kV, pulse strength of gas and metal ion 0.25 A and 0.50 A, operabion frequency 10-50Hz, beam spot area 200cm2. In the paper, ion injection application of ion source is described.