摘要
用分子束技术和电子能谱研究了在Cu_2O涂层上CH_4的氧化反应。实验得到,这个反应的发生需要具备下述条件:(1)Cu_2O表面对氧呈解离吸附,并提供出活性氧原子;(2)CH_4分子束的平动能必须超过59kJ/mol;(3)样品温度不能超过750K。
The oxidation of CH_4 on Cu_2O coat has been studied with the molecular beam technique and the electron spectroseopy. It is found that this reaction occurs under the following conditions: (1) The dissociative a adsorption of O_2 on the Cu_2O coat offers an active oxygen atom; (2) The translational energy of CH_4 molecular beam has to be larger than 59 kJ/mol; (3) The temperature of the sample has to be below 750 K.
出处
《真空科学与技术》
CSCD
1993年第1期65-72,共8页
Vacuum Science and Technology
基金
国家自然科学基金
关键词
分子束
俄歇电子谱
甲烷
氧化
涂层
Molecular beam technigues, Catalysis, Translational energy, Auger electron spectroscopy