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薄膜应力的研究 被引量:2

STUDY OF STRESS IN THIN FILMS
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摘要 本文首先简述了薄膜应力研究的发展过程,并指出了薄膜应力在薄膜研究与生产中的普遍性和重要性。薄膜应力研究的基本问题包括应力的测量、应力产生的机制、应力的控制和应力的作用。应力与薄膜结构、性能之间存在着相互影响的复杂关系。在综述前人研究工作的基础上,本文还简要介绍了Co—Cr合金膜和Gd-Fe合金膜的应力研究结果。 At first, this paper briefly describes the developing history about the study of stress in thin films. The generalization as well as the importance of the stress in the study and production of thin films are emphasized. The basic problems in the study of stress include the measurement of stress, the mechanism of the origin of stress, the control of stress and the actions of stress. Complex relations exist among the stress, the structure and the properties. After summarizing the work finished by other researchers, the new results about the stresses in Co-Cr and Gd-Fe alloy thin films are introduced briefly.
出处 《真空科学与技术》 CSCD 1993年第2期130-137,共8页 Vacuum Science and Technology
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参考文献2

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同被引文献15

  • 1杨杰,王晨,陶琨,范毓殿.铜薄膜与Al_2O_3陶瓷界面结合力的IBAD过渡层增强[J].真空科学与技术,1993,13(5):352-355. 被引量:4
  • 2李钦虎,王军.磁控反应溅射沉积CrN薄膜的抗氧化性研究[J].表面技术,2005,34(6):40-41. 被引量:16
  • 3胡志彪,李贺军,付前刚,陈强,王兰英.低摩擦系数固体润滑涂层研究进展[J].材料工程,2006,34(3):60-63. 被引量:44
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