摘要
本文第1部分评述了低压气相合成金刚石的进展。第2部分介绍了用表面分析方法和HREM对金刚石(111)和(100)面的生长机理,原子氢和氧对金刚石生长本身的影响,亚稳态条件下金刚石的晶形显露规律,硅衬底上的形核机理和初期生长规律进行研究所取得的重要进展。
In part Ⅰ of this paper the progress of diamond growth by CVD method is reviewed. In part Ⅱ,the growth mechanism of diamond (111) and (100) surfaces, the effect of atomic hydroger and oxygen on diamond growth,the rule of diamond crystalline appearrance,the nucleation mechanism and the rule in initial growth stage of diamond on Si substrate using surface analysis techniques and HREM are investigated.
出处
《真空科学与技术》
CSCD
1993年第3期149-163,共15页
Vacuum Science and Technology
关键词
金刚石
气相沉积
低压合成
Diamond, HREELS, Growth mechanism, CVD
