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溅射SnO_xF_y与SnN_xF_y减反射涂层

SPUTTERED SnO_xF_y AND SnN_xF_y ANTIREFLECTION COATINGS
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摘要 反应高频磁控溅射SnO_xF_y与SnN_xF_y膜的沉积率约达50nm/min,这些膜的折射率约1.7,可用于作为金属氧化物涂层的减反膜。给出了SnO_xF_y/SnO_x与SnN_xF_y/SnO_x,多层膜的减反射性能。 Films of SnO_xF_y and SnN_xF_y were made by reactive rf magnetron sputtering at rates up to 50 nm/min. they have refractive indices, of about 1.7 and are useful for antireflecting metaloxide -coated substrates. Spectral optical data,showing the antireflection property,are given for SnO_x/SnO_xF_y and SnO_x/SnN_xF_y tandem layers.
出处 《真空科学与技术》 CSCD 1993年第3期211-215,共5页 Vacuum Science and Technology
关键词 溅射 锡氧氟 锡氮氟 薄膜 涂层 SnO_xF_y thin film, SnN_xF_y thin film, Antireflection coating
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参考文献1

  • 1K. R. Ryan,I. C. Plumb. Gas-phase reactions of CF2 with O(3P) to produce COF: Their significance in plasma processing[J] 1984,Plasma Chemistry and Plasma Processing(4):271~283

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