摘要
反应高频磁控溅射SnO_xF_y与SnN_xF_y膜的沉积率约达50nm/min,这些膜的折射率约1.7,可用于作为金属氧化物涂层的减反膜。给出了SnO_xF_y/SnO_x与SnN_xF_y/SnO_x,多层膜的减反射性能。
Films of SnO_xF_y and SnN_xF_y were made by reactive rf magnetron sputtering at rates up to 50 nm/min. they have refractive indices, of about 1.7 and are useful for antireflecting metaloxide -coated substrates. Spectral optical data,showing the antireflection property,are given for SnO_x/SnO_xF_y and SnO_x/SnN_xF_y tandem layers.
出处
《真空科学与技术》
CSCD
1993年第3期211-215,共5页
Vacuum Science and Technology
关键词
溅射
锡氧氟
锡氮氟
薄膜
涂层
SnO_xF_y thin film, SnN_xF_y thin film, Antireflection coating