电子束法沉积ITO膜的XPS研究

XPS STUDY OF THE ITO FILMS DEPOSITED BY ELECTRON BEAM

采用电子束蒸发法制备了均匀、致密、透明导电的ITO膜。讨论了其光电性能,并用XPS技术研究了ITO膜的表面组成、结构和状态。

The deposition process of ITO films by electron beam technique is studied. Uniform and compact ITO films have been obtained. These films are degenerate n- type semiconduction, they are used as a window materal in solar cells. The effect of heat treatment (300℃) in H_2 and N_2 environments on the electrical and optical properties of ITO films has been investigated. A sheet resistance between 4.5～20Ω/□ and a transmittance of over 90% in the visible part of the spectrum were obtained. The compositions, structures, state of ITO films and surface segregation of Sn have been studied by XPS.